상세정보
학술대회
UV Nanoimprint Lithography of Polymer Photonic Crystal Slab Waveguides for Nano-Photonic Integrated Circuits
Cited - time in 
Download 0 time
Share 
Download 0 time
Share
- 발행일
- 200609
- 출처
- Microoptics Conference (MOC) 2006, pp.102-103
- 협약과제
- 06SB1200, 나노 패턴 공정 및 나노 광소자 개발, 최춘기
- 초록
- We report an application of UV nanoimprint lithography for the fabrication of two-dimensional polymer photonic crystal slab waveguides. With the aid of optimized resin droplet size and imprint pressure, air-hole photonic crystal structures were replicated on the optical polymer resin. By incorporating buffered oxide etch process, the glass substrate was selectively etched and the imprinted polymer photonic crystal slab waveguides were air-suspended as a membrane. The UV nanoimprinted polymer photonic crystal slab waveguides will be an attractive candidate for the implementations of ultra-compact photonic nano-systems and nano-photonic integrated circuits.
- KSP 제안 키워드
- Air holes, Glass substrate, Imprinted polymer, Nano-photonic integrated circuits, Oxide etch, Photonic crystal slab, Photonic crystal structure, Polymer photonic crystal, Polymer resin, Slab waveguide, UV nanoimprint lithography