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Conference Paper Electrical Characterization of Semiconducting Nanowire and Its Application to a Chemical Sensor
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Authors
Jong Hyurk Park, S-E. Moon, Eun Kyung Kim, H.-Y. Lee, K.-H. Park, G.-T. Kim
Issue Date
2006-10
Citation
The Electrochemical Society (ECS) Meeting 2006, pp.231-237
Publisher
Electrochemical Society (ECS)
Language
English
Type
Conference Paper
DOI
https://dx.doi.org/10.1149/1.2357263
Abstract
Semiconducting oxide nanowire devices were fabricated using more convenient way to combine photolithography and e-beam lithography, and their electrical properties were studied. To realize the reliable device operation which is a key factor for a chemical sensor, the contact resistance should be optimized. Here, we studied the contact resistance problem under post-deposition annealing or etching process using scanning probe microscopic tool to analyze IV spectroscopic and surface potential behaviors. And, its performance as a chemical sensor was also studied for several gas species. copyright The Electrochemical Society.
KSP Keywords
Chemical sensors, Contact resistance(73.40.Cg), E-beam Lithography, Electrical characterization, Etching process, Key factor, Oxide nanowires, Postdeposition annealing(PDA), Scanning probe, Semiconducting Oxide, Semiconducting nanowire