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Conference Paper
Characterization and Optimization of Plasma-Enhanced Chemical Vapor Deposited SiO2 Film as a Hydrogen Diffusion Barrier in Metal Oxide Thin-Film Transistors
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- Authors
- Sung Haeng Cho, Hee-Ok Kim, Oh-Sang Kwon, Eun-Sook Park, Jong-Heon Yang, Chi-Sun Hwang, Sang-Hee Ko Park
- Issue Date
- 2015-08
- Citation
- International Meeting on Information Display (IMID) 2015, pp.332-332
- Language
- English
- Type
- Conference Paper
- KSP Keywords
- Chemical vapor deposited, Diffusion barrier(DB), Metal-oxide(MOX), Plasma-enhanced chemical vapor, Thin-Film Transistor(TFT), hydrogen diffusion, metal oxide thin film transistors, thin film(TF)