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학술지 Pentacene Thin-film Transistors and Inverters with Plasma-enhanced Atomic-layer-deposited Al2O3 Gate Dielectric
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저자
구재본, 임정욱, 김성현, 윤선진, 구찬회, 임상철, 이정헌
발행일
200701
출처
Thin Solid Films, v.515 no.5, pp.3132-3137
ISSN
0040-6090
출판사
Elsevier
DOI
https://dx.doi.org/10.1016/j.tsf.2006.08.037
협약과제
06ZB1300, 플라스틱 트랜지스터 소자/소재 기술, 김성현
초록
The performances of pentacene thin-film transistor with plasma-enhanced atomic-layer-deposited (PEALD) 150혻nm thick Al2O3 dielectric are reported. Saturation mobility of 0.38혻cm2/V s, threshold voltage of 1혻V, subthreshold swing of 0.6혻V/decade, and on/off current ratio of about 108 have been obtained. Both depletion and enhancement mode inverter have been realized with the change of treatment method of hexamethyldisilazane on PEALD Al2O3 gate dielectric. Full swing depletion mode inverter has been demonstrated at input voltages ranging from 5혻V to - 5혻V at supply voltage of - 5혻V. © 2006 Elsevier B.V. All rights reserved.
KSP 제안 키워드
Full Swing, ON/OFF current ratio, Pentacene thin-film transistors, Plasma-enhanced, Saturation mobility, Supply voltage, Thin-Film Transistor(TFT), Treatment method, depletion mode, enhancement-mode, gate dielectric