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학술지 Selective-area MOVPE Growth for 10 Gbit/s Electroabsorption Modulator Integrated with a Tunable DBR Laser
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저자
김성복, 심재식, 김기수, 심은덕, 류상완, 박홍이
발행일
200701
출처
Journal of Crystal Growth, v.298, pp.672-675
ISSN
0022-0248
출판사
Elsevier
DOI
https://dx.doi.org/10.1016/j.jcrysgro.2006.10.210
협약과제
06MB1900, 광엑세스용 광집적 모듈, 오광룡
초록
We have designed and fabricated electroabsorption modulator integrated monolithically with a distributed Bragg reflector laser using selective area growth (SAG) by metalorganic vapor phase epitaxy (MOVPE). Through the bandgap engineering due to the growth rate enhancement and compositional variation from the difference of migration and/or diffusion length of species by various SAG mask pattern, we have achieved the photoluminescence peak wavelengths of active layer in the laser, modulator, and Bragg grating regions to 1.557, 1.503, and 1.442 μm, respectively. The electroabsorption modulator-integrated laser shows a good performance including threshold current of below 6 mA, output power of 5 mW for 45 mA current injected in the active region, and high side-mode suppression ratio over 45 dB with the 3-dB modulation bandwidth over 11 GHz. © 2006 Elsevier B.V. All rights reserved.
키워드
A3. Selective epitaxy, A3. Thin film/epitaxy growth
KSP 제안 키워드
10 Gbit/s, 11 GHz, 3-dB modulation bandwidth, Active Layer, Bragg grating(FBG), Compositional variation, DBR laser, Diffusion length, Distributed Bragg reflector laser, Epitaxy growth, Growth rate