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The Formation of Silicon Quantum Dots in Silicon Nitride Film based on the Gas Mixture of SiH4/N2 AND SiH4/NH3
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- 발행일
- 200707
- 출처
- International Conference on Surfaces, Coatings and Nanostructured Materials (NanoSMat) 2007, pp.322-323
- 협약과제
- 07ZB1200, 정보통신미래신기술연구사업, 정태형
- KSP 제안 키워드
- Gas mixture, Quantum Dot(QD), Silicon nitride film, Silicon quantum dots