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Temperature Dependence of Silicon Nanophotonic Ring Resonator With a Polymeric Overlayer
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- Authors
- Jong-Moo Lee, Duk-Jun Kim, Ho Kyun Ahn, Sang-Ho Park, Gyung Ock Kim
- Issue Date
- 2007-08
- Citation
- IEEE/OSA Journal of Lightwave Technology, v.25, no.8, pp.2236-2243
- ISSN
- 0733-8724
- Publisher
- IEEE, OSA
- Language
- English
- Type
- Journal Article
- Abstract
- In this paper, we investigate the temperature dependence of a silicon-on-insulator-based silicon nanophotonic ring resonator covered with a polymeric overlayer. Temperature-dependent wavelength shift is measured to be as low as 5 pm/°C for the TM mode in a silicon ring resonator composed of a 500 × 220 nm2 channel waveguide. We also show through simulations and experiments that the temperature dependence can be reduced for the TE mode or for both the TE and TM modes by adjusting the mode volume of a silicon nanophotonic waveguide. © 2007 IEEE.
- KSP Keywords
- 20 nm, Mode volume, Show through, Silicon On Insulator(SOI), Silicon ring resonator, TE Mode, TM mode, Temperature-dependent, channel waveguide, temperature dependence, wavelength shift