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학술대회 Vanadium Dioxide Films Deposited on SiO2- and Al2O3-coated Si Substrates Using Reactive RF-Magnetron Sputter Deposition Technique
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저자
윤선진, 임정욱, 채병규, 김현탁
발행일
200709
출처
International Conference on Solid State Devices and Materials (SSDM) 2007, pp.564-565
KSP 제안 키워드
RF-magnetron sputter deposition, Si substrate, Sputter deposition technique, Vanadium dioxide films