ETRI-Knowledge Sharing Plaform

KOREAN
논문 검색
Type SCI
Year ~ Keyword

Detail

Conference Paper Novel Process for the Electrodes of Microbolometer
Cited 1 time in scopus Share share facebook twitter linkedin kakaostory
Authors
Ho Jun Ryu, Seong-Mok Cho, Woo Seok Yang, Sang Hoon Cheon, Byoung-Gon Yu
Issue Date
2007-10
Citation
International Conference on Sensor Technologies and Applications (SENSORCOMM) 2007, pp.10-13
Language
English
Type
Conference Paper
DOI
https://dx.doi.org/10.1109/SENSORCOMM.2007.4394889
Abstract
The electrodes for microbolometer it has been required to have low thermal conductivity, low electrical resistivity, and low stress for small deflection of microbolometer membrane. In this work we introduced the nickel-chrome alloy as an electrode for our designed microbolometer. To define an electrode on the membrane the etching process is indispensable. Using a dry etching technique there is a selectivity problem with underlayer of nickel-chrome alloy layer during etching process. The other hand there is a topological deterioration, which causes a bad effect for further planarizaiton process when we use wet process. We had fabricated the electrode of microbolometer using hybrid etching technique. Therefore we have successfully established the hybrid etching process for nickel-chrome alloy film which is used for the resistive microbolometer. © 2007 IEEE.
KSP Keywords
Alloy films, Alloy layer, Etching process, Etching technique, Low stress, Low thermal conductivity, Novel process, Wet process, dry etching, low electrical resistivity