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Conference Paper
The Effect of Annealing Treatment on Indium Oxide/Zinc Oxide Heterostructured Thin Films Transistors Grown by Plasma Enhanced Atomic Layer Deposition
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- Authors
- Hwan-Jae Lee, Jeong-Mu Lee, Jin-Seong Park, Seung-Youl Kang, SeongDeok Ahn
- Issue Date
- 2015-12
- Citation
- International Conference on Advanced Materials and Devices (ICAMD) 2015, pp.1-1
- Language
- English
- Type
- Conference Paper
- KSP Keywords
- Annealing Treatment, Plasma-enhanced atomic layer deposition, Thin films transistors, Zinc Oxide(ZnO), effect of annealing, indium oxide, thin film(TF)