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Journal Article Time Dependent Resistance Change of Amorphous Phase in Phase-Change Nonvolatile Memories
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Authors
Sung-Min Yoon, Kyu-Jeong Choi, Nam-Yeal Lee, Seung-Yun Lee, Young-Sam Park, Byoung-Gon Yu, Tae-Jin Park, Se-Young Choi
Issue Date
2007-09
Citation
Integrated Ferroelectrics, v.93, no.1, pp.83-89
ISSN
1058-4587
Publisher
Taylor & Francis
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1080/10584580701756151
Abstract
For the realization of reliable nonvolatile phase-change memory operations, it is very important to understand the long-term behaviors of memory states with different resistance values. We investigated the time-dependent behaviors of RESET resistance states (RR) for the fabricated memory devices using Sn-doped GST, in which Sn amounts were varied to control the initial values of RR. It was found that the transient variations of RR showed an increasing trend with time, and that their behaviors were closely related to the microstructure of amorphous phase in the phase-change material.
KSP Keywords
Amorphous Phase, Initial value, Memory states, Non-Volatile Memory(NVM), Phase Change Material(PCM), Resistance change, Sn-doped, Time-dependent, memory device