ETRI Knowledge Sharing Platform : Rapid Vapor-Phase Fabrication of Organic-Inorganic Hybrid Superlattices with Monolayer Precision

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Journal Article Rapid Vapor-Phase Fabrication of Organic-Inorganic Hybrid Superlattices with Monolayer Precision

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Authors: Byoung H. Lee, Min Ki Ryu, Sung-Yool Choi, Kwang-H. Lee, Seon Gil Im, Myung M. Sung

Citation: Journal of the American Chemical Society, v.129, no.51, pp.16034-16041

Project Code: 07SB1300, Development of Organic Materials for Organic Electronic Devices, Sung-Yool Choi

Abstract: We report a new layer-by-layer growth method of self-assembled organic multilayer thin films based on gas-phase reactions. In the present molecular layer deposition (MLD) process, alkylsiloxane self-assembled multilayers (SAMs) were grown under vacuum by repeated sequential adsorptions of C= C-terminated alkylsilane and titanium hydroxide. The MLD method is a self- limiting layer-by-layer growth process, and is perfectly compatible with the atomic layer deposition (ALD) method. The SAMs films prepared exhibited good thermal and mechanical stability, and various unique electrical properties. The MLD method, combined with ALD, was applied to the preparation of organic-inorganic hybrid nanolaminate films in the ALD chamber. The organic-inorganic hybrid superlattices were then used as active mediums for two-terminal electrical bistable devices. The advantages of the MLD method with ALD include accurate control of film thickness, large-scale uniformity, highly conformai layering, sharp interfaces, and a vast library of possible materials. The MLD method with ALD is an ideal fabrication technique for various organic-inorganic hybrid superlattices. © 2007 American Chemical Society.

KSP Keywords: Accurate control, Atomic Layer Deposition, Electrical bistable devices, Fabrication techniques, Gas-phase reactions, Growth method, Growth process, Layer-by-Layer(LbL), Layer-by-layer growth, Molecular layer deposition, Organic-inorganic hybrid

218 Gajeong-ro, Yuseong-gu, Daejeon, 34129, KOREA, Contact: sh.kim@etri.re.kr

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