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Conference Paper The Effect of Post-Annealing on Bias Stability of InOx/ZnO Superlattice Thin Film Transistors Grown by Plasma Enhanced Atomic Layer Deposition
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Authors
Hwan-Jae Lee, Seong-Deok Ahn, Seung-Youl Kang, Jin-Seong Park
Issue Date
2015-09
Citation
Asian-European International Conference on Plasma Surface Engineering (AEPSE) 2015, pp.1-1
Language
English
Type
Conference Paper
KSP Keywords
Bias stability, Plasma-enhanced atomic layer deposition, Post-annealing, Thin-Film Transistor(TFT), thin film(TF)