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Journal Article Nanocrystalline ZnO Film Layer on Silicon and its Application to Surface Acoustic Wave-Based Streaming
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Authors
Dae-Sik Lee, Jikui Luo, Yongqing Fu, William I Milne, Nae-Man Park, Sang Hyeob Kim, Mun Yeon Jung, Sung Lyul Maeng
Issue Date
2008-09
Citation
Journal of Nanoscience and Nanotechnology, v.8, no.9, pp.4626-4629
ISSN
1533-4880
Publisher
American Scientific Publishers (ASP)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1166/jnn.2008.IC44
Project Code
06MB4700, IT-BT-NT Convergent Core Technology for advanced Optoelectronic Devices and Smart Bio/Chemical Sensors, Maeng Sunglyul
Abstract
A surface acoustic wave (SAW) device consisting of 1-6 μm-thick ZnO thin films deposited on Si wafer was designed, fabricated, and characterized in this study. Photolithographic protocols for interdigitated transducers (IDTs) and surface modification using fluoroalkylsilane are employed with the aim of droplet-based microfluidic actuations in bio-microsystems. A ZnO thin film was grown on a 4?? silicon wafer with c-axis orientation, an average roughness of 11.6 nm, and a small grain size of 20 nm. It was found that the resonant frequencies (Rayleigh and Sezawa modes) of SAW devices move to a lower frequency range as the thickness of the ZnO thin films increases. Through the silane surface modification, a hydrophobic surface with a contact angle of 114째 was obtained. Finally, liquid streaming by acoustic wave was demonstrated by observing the actuation of SiO 2 microparticles in a microfluidic drop. Copyright © 2008 American Scientific Publishers All rights reserved.
KSP Keywords
20 nm, Contact angle(CA), Frequency Range, Hydrophobic surface, Nanocrystalline ZnO, Resonant frequency(Fr), Si wafer, SiO 2, Silicon wafer, Small grain size, Surface acoustic wave (SAW) device