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학술대회 Post-Annealing and Passivations of Transparent Bottom Gate IGZO Thin Film Transistors
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저자
조두희, 양신혁, 신재헌, 유민기, 정우석, 변춘원, 윤성민, 박상희, 이정익, 황치선, 추혜용
발행일
200805
출처
Society for Information Display (SID) International Symposium 2008, pp.1243-1246
DOI
https://dx.doi.org/10.1889/1.3069362
협약과제
07MB2900, 투명전자 소자를 이용한 스마트 창, 조경익
초록
We have examined post-annealing and passivation for the transparent bottom gate IGZO TFT having an inverse co-planar structure. The oxygen-vacuum two step annealing enhanced the field effect mobility up to 18 cm2/Vs and the sub-threshold swing down to 0.2 V/dec. However, the hysterysis and the bias stability problems could not be solved just by post-annealing. Thus, we have passivated the bottom gate IGZO TFTs with organic and inorganic materials. Ga2O3, Al2O3, SiO2 and some polymer materials were effective materials for passivations. The hysterysis and the stability of the TFTs were remarkably improved by the passivations. © 2008 SID.
KSP 제안 키워드
Bottom gate, Co-Planar, IGZO TFTs, IGZO thin film, Organic and inorganic materials, Polymer materials, Post-annealing, Thin-Film Transistor(TFT), Two-step annealing, bias stability, field-effect mobility