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학술지 Multichannel Silicon WDM Ring Filters Fabricated with DUV Lithography
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저자
이종무, 박상기, 김경옥
발행일
200809
출처
Optics Communications, v.281 no.17, pp.4302-4306
ISSN
0030-4018
출판사
Elsevier
DOI
https://dx.doi.org/10.1016/j.optcom.2008.04.047
협약과제
07MB1500, 실리콘 기반 초고속 광인터커넥션 IC, 김경옥
초록
We have fabricated 9-channel silicon wavelength-division-multiplexing (WDM) ring filters using 193 nm deep-ultraviolet (DUV) lithography and investigated the spectral properties of the ring filters by comparing the transmission spectra with and without an upper cladding. The average channel-spacing of the 9-channel WDM ring filter with a polymeric upper cladding is measured about 1.86 nm with the standard deviation of the channel-spacing about 0.34 nm. The channel crosstalk is about -30 dB, and the minimal drop loss is about 2 dB. © 2008 Elsevier B.V. All rights reserved.
KSP 제안 키워드
193 nm, Channel crosstalk, Spectral properties, Standard deviation(STD), Transmission spectra, Wavelength Division Multiplexing(WDM), deep-ultraviolet (DUV) lithography, ring filter