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Multichannel Silicon WDM Ring Filters Fabricated with DUV Lithography
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- Authors
- Jong-Moo Lee, Sahng Gi Park, Gyung Ock Kim
- Issue Date
- 2008-09
- Citation
- Optics Communications, v.281, no.17, pp.4302-4306
- ISSN
- 0030-4018
- Publisher
- Elsevier
- Language
- English
- Type
- Journal Article
- Project Code
- 07MB1500, Silicon-based high-speed optical interconnection IC, Kim Gyungock
- Abstract
- We have fabricated 9-channel silicon wavelength-division-multiplexing (WDM) ring filters using 193 nm deep-ultraviolet (DUV) lithography and investigated the spectral properties of the ring filters by comparing the transmission spectra with and without an upper cladding. The average channel-spacing of the 9-channel WDM ring filter with a polymeric upper cladding is measured about 1.86 nm with the standard deviation of the channel-spacing about 0.34 nm. The channel crosstalk is about -30 dB, and the minimal drop loss is about 2 dB. © 2008 Elsevier B.V. All rights reserved.
- KSP Keywords
- 193 nm, Channel crosstalk, Spectral properties, Standard deviation(STD), Transmission spectra, Wavelength Division Multiplexing(WDM), deep-ultraviolet (DUV) lithography, ring filter