상세정보
학술지
Influence of Ar and NH3 Plasma Treatment on Surface of Poly(monochloro-para-xylylene) Dielectric Films Processed in Oxygen Plasma
- 발행일
- 200808
- 출처
- Japanese Journal of Applied Physics, v.47 no.8, pp.6970-6973
- ISSN
- 0021-4922
- 출판사
- Japan Society of Applied Physics (JSAP), Institute of Physics (IOP)
- 협약과제
- 08ZB1200, 정보통신 미래신기술연구사업(나노 기반 신개념 소자연구), 정태형
- 초록
- The surface of the poly(monochloro-para-xylylene) (parylene-C) films after Ch plasma and successive Ar and NHj plasma treatment was investigated using a contact angle and an X-ray photoelectron spectroscopy (XPS) measurement. In this work, it was confirmed that the polymer hydrophilicity after the O2 plasma treatment was sharply increased due to the formation of the highly oxidized surface layer. It was shown that exposure in an ammonia plasma led to the formation of nitrogen-containing groups on the polymer surface. It was found that both Ar and NH3 plasma treatment of the preliminary oxidized polymer led to the moderate extension of the water contact angle due to the decrease of the oxygen-containing polar groups' concentrations on the parylene surface. © 2008 The Japan Society of Applied Physics.
- KSP 제안 키워드
- Ammonia plasma, Applied physics, Contact angle(CA), Dielectric films, NH3 plasma, Nitrogen-containing, Oxidized surface layer, Polar group, Polymer LED, Polymer surfaces, X-ray photoelectron spectroscopy (xps)