ETRI-Knowledge Sharing Plaform

KOREAN
논문 검색
Type SCI
Year ~ Keyword

Detail

Journal Article Optical AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition
Cited 9 time in scopus Share share facebook twitter linkedin kakaostory
Authors
Jung Wook Lim, Sun Jin Yun, Hyun Tak Kim
Issue Date
2008-08
Citation
Japanese Journal of Applied Physics, v.47, no.8, pp.6934-6937
ISSN
0021-4922
Publisher
Japan Society of Applied Physics (JSAP), Institute of Physics (IOP)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1143/JJAP.47.6934
Abstract
AlxTi1-xOy (ATO) films were deposited by plasma enhanced atomic layer deposition (PEALD). In the deposition, it was possible to tailor the refractive index and the thickness of films by adjusting the number of cycles used for Al2O3 and TiO2 sublayers. Because optical thickness can be controlled, ATO films will be applicable to optical filters, high reflectivity coating layers and antireflection coating layers. © 2008 The Japan Society of Applied Physics.
KSP Keywords
Applied physics, High reflectivity, Optical filters, Optical thickness, Plasma-enhanced atomic layer deposition, antireflection coating, number of cycles, refractive index