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Optical AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition
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- Authors
- Jung Wook Lim, Sun Jin Yun, Hyun Tak Kim
- Issue Date
- 2008-08
- Citation
- Japanese Journal of Applied Physics, v.47, no.8, pp.6934-6937
- ISSN
- 0021-4922
- Publisher
- Japan Society of Applied Physics (JSAP), Institute of Physics (IOP)
- Language
- English
- Type
- Journal Article
- Abstract
- AlxTi1-xOy (ATO) films were deposited by plasma enhanced atomic layer deposition (PEALD). In the deposition, it was possible to tailor the refractive index and the thickness of films by adjusting the number of cycles used for Al2O3 and TiO2 sublayers. Because optical thickness can be controlled, ATO films will be applicable to optical filters, high reflectivity coating layers and antireflection coating layers. © 2008 The Japan Society of Applied Physics.
- KSP Keywords
- Applied physics, High reflectivity, Optical filters, Optical thickness, Plasma-enhanced atomic layer deposition, antireflection coating, number of cycles, refractive index