상세정보
학술지
Optical AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition
- 발행일
- 200808
- 출처
- Japanese Journal of Applied Physics, v.47 no.8, pp.6934-6937
- ISSN
- 0021-4922
- 출판사
- Japan Society of Applied Physics (JSAP), Institute of Physics (IOP)
- 협약과제
- 08MB3100, 전기적 점프(Current Jump)를 이용한 신소자 기술, 김현탁
- 초록
- AlxTi1-xOy (ATO) films were deposited by plasma enhanced atomic layer deposition (PEALD). In the deposition, it was possible to tailor the refractive index and the thickness of films by adjusting the number of cycles used for Al2O3 and TiO2 sublayers. Because optical thickness can be controlled, ATO films will be applicable to optical filters, high reflectivity coating layers and antireflection coating layers. © 2008 The Japan Society of Applied Physics.
- KSP 제안 키워드
- Applied physics, High reflectivity, Optical filters, Optical thickness, Plasma-enhanced atomic layer deposition, antireflection coating, number of cycles, refractive index