상세정보
학술지
Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl2/X (X=Ar, He, N2) Inductively Coupled Plasmas
- 저자
- Alexander Efremov, 김남기, 최복길, 백규하, 권광호
- 발행일
- 200810
- 출처
- Journal of the Electrochemical Society, v.155 no.12, pp.D777-D782
- ISSN
- 0013-4651
- 출판사
- Electrochemical Society (ECS)
- 협약과제
- 08SB1200, 나노임프린트 적용 Sub-30nm Gate MOSFET 연구, 도이미
- 초록
- This work reports the influence of gas mixing ratio on the Cl2 Ar, Cl2 He, and Cl2 N2 plasma parameters, steady-state densities, and fluxes of active species in the planar inductively coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probes and quadrupole mass spectroscopy with a global (zero-dimensional) plasma model. It was shown that the dilution of Cl 2 by any additive gas results in a noticeable change in both the electron temperature and density, as well as provides the acceleration in the electron impact dissociation kinetics of Cl2 molecules. No qualitative differences for the given three systems in regard to relative changes in active species densities and model-predicted etch rate behaviors were obtained. © 2008 The Electrochemical Society.
- KSP 제안 키워드
- Additive gas, Cl 2, Dissociation kinetics, Electron impact dissociation, Electron temperature and density, Etch rates, Gas mixing, Inductively coupled plasma reactor, Inductively-coupled plasma(ICP), Langmuir probe, Mixing ratio