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Journal Article
Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl2/X (X=Ar, He, N2) Inductively Coupled Plasmas
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- Authors
- Alexander Efremova, Nam-Ki Minb, Bok-Gil Choic, Kyu-Ha Baekd, Kwang-Ho Kwon
- Issue Date
- 2008-10
- Citation
- Journal of the Electrochemical Society, v.155, no.12, pp.D777-D782
- ISSN
- 0013-4651
- Publisher
- Electrochemical Society (ECS)
- Language
- English
- Type
- Journal Article
- Abstract
- This work reports the influence of gas mixing ratio on the Cl2 Ar, Cl2 He, and Cl2 N2 plasma parameters, steady-state densities, and fluxes of active species in the planar inductively coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probes and quadrupole mass spectroscopy with a global (zero-dimensional) plasma model. It was shown that the dilution of Cl 2 by any additive gas results in a noticeable change in both the electron temperature and density, as well as provides the acceleration in the electron impact dissociation kinetics of Cl2 molecules. No qualitative differences for the given three systems in regard to relative changes in active species densities and model-predicted etch rate behaviors were obtained. © 2008 The Electrochemical Society.
- KSP Keywords
- Additive gas, Cl 2, Dissociation kinetics, Electron impact dissociation, Electron temperature and density, Etch rates, Gas mixing, Inductively coupled plasma reactor, Inductively-coupled plasma(ICP), Langmuir probe, Mixing ratio