상세정보
학술대회
Identifying Resonance Frequency Deviations for High Order Nano-Wire Ring Resonator Filters based on a Coupling Strength Variation
- 발행일
- 200902
- 출처
- Silicon Photonics IV (SPIE 7220), v.7220, pp.1-12
- 협약과제
- 09MB1100, 실리콘 기반 초고속 광인터커넥션 IC, 김경옥
- 초록
- Third order ring resonators are designed and their resonance frequency deviations are analyzed experimentally by processing them with E-beam lithography and ICP etching in a CMOS nano-Fabrication laboratory. We developed a reliable method to identify and reduce experimentally the degree of deviation of each ring resonance frequency before completion of the fabrication process. The identified deviations can be minimized by the way to be presented in this paper. It is expected that this method will provide a significant clue to make a high order multi-channel ring resonators. © 2009 SPIE.
- KSP 제안 키워드
- E-beam Lithography, Frequency Deviation, ICP etching, Nano-fabrication, Nano-wires, Resonance frequency, Ring resonator filters, Strength variation, Third-order, coupling strength, fabrication process