ETRI-Knowledge Sharing Plaform

ENGLISH

성과물

논문 검색
구분 SCI
연도 ~ 키워드

상세정보

학술대회 Novel Micro Capacitive Inclinometer with Oblique Comb Electrode and Suspension Spring Aligned Parallel to {111} Vertical Planes of (110) Silicon
Cited 4 time in scopus Download 0 time Share share facebook twitter linkedin kakaostory
저자
정대훈, 윤성식, 이명래, 황건, 최창억, 이종현
발행일
200901
출처
International Conference on Micro Electro Mechanical Systems (MEMS) 2009, pp.797-800
출판사
IEEE
DOI
https://dx.doi.org/10.1109/MEMSYS.2009.4805503
협약과제
08MB1900, 유비쿼터스용 CMOS 기반 MEMS 복합센서기술개발, 최창억
초록
A novel high resolution micro capacitive inclinometer has been developed using (110) silicon. KOH crystalline wet etching was employed after silicon deep reactive ion etching (DRIE) to reduce mo hologic defects on the sidewalls of oblique comb electrodes aligned parallel to vertical {111 plane. Suspension springs are also parallel to other vertical { 111 } plane to secure the width during KOH wet etching. The sensitivity (pF/째) was increased because the oblique comb electrodes change both the overlapped area and gap during operation. The capacitance changed from -0.8 to 0.8 pF for -90째-90째 and resolution was estimated at 0.18째 or less for 짹80째. ©2009 IEEE.
KSP 제안 키워드
Deep reactive ion etching, High-resolution, KOH wet etching, Reactive ion etching(RIE), Suspension spring, comb electrodes