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Photo-Cured Polymeric Insulating Materials Having High-Performance Electrical Properties
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- Authors
- Gi Heon Kim, Sung Min Yoon, Chul Am Kim, Kyung Soo Suh
- Issue Date
- 2009-02
- Citation
- Molecular Crystals and Liquid Crystals, v.499, no.알수없음, pp.193-204
- ISSN
- 1542-1406
- Publisher
- Taylor & Francis
- Language
- English
- Type
- Journal Article
- Abstract
- Chemically and thermally stable, durable, photosensitive polymeric insulating materials are in great demand for fabrication of electronic devices. In this study, we have synthesized photosensitive polymers by mixing a host polymer and photosensitizer, and explored their chemical and electrical properties. Uniform, chemically stable, mechanically flexible pinhole-free films can be formed by spin-coating, baking and photolithography at a relatively low temperature (150C); these films are clearly defined by photolithography technique. Their electrical properties showed excellent electrical performance as insulators which depend on chemical structure of a host polymer used and photosensitizer (DAST) concentration. In particular, the insulating property was improved after photo-cross-linking reaction, which is adequate for plastic-based electronic devices such as organic thin-film transistor and flexible display.
- KSP Keywords
- Cross-linking reaction, High performance, Insulating materials, Insulating properties, Low temperature(LT), Organic thin-film transistors, Photo-crosslinking, Photolithography technique, Photosensitive polymers, Spin coating, Thermally stable