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Journal Article Photo-Cured Polymeric Insulating Materials Having High-Performance Electrical Properties
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Authors
Gi Heon Kim, Sung Min Yoon, Chul Am Kim, Kyung Soo Suh
Issue Date
2009-02
Citation
Molecular Crystals and Liquid Crystals, v.499, no.알수없음, pp.193-204
ISSN
1542-1406
Publisher
Taylor & Francis
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1080/15421400802619826
Project Code
07MB1600, Flexible Display, Cho Kyoung Ik
Abstract
Chemically and thermally stable, durable, photosensitive polymeric insulating materials are in great demand for fabrication of electronic devices. In this study, we have synthesized photosensitive polymers by mixing a host polymer and photosensitizer, and explored their chemical and electrical properties. Uniform, chemically stable, mechanically flexible pinhole-free films can be formed by spin-coating, baking and photolithography at a relatively low temperature (150C); these films are clearly defined by photolithography technique. Their electrical properties showed excellent electrical performance as insulators which depend on chemical structure of a host polymer used and photosensitizer (DAST) concentration. In particular, the insulating property was improved after photo-cross-linking reaction, which is adequate for plastic-based electronic devices such as organic thin-film transistor and flexible display.
KSP Keywords
Cross-linking reaction, High performance, Insulating materials, Insulating properties, Low temperature(LT), Organic thin-film transistors, Photo-crosslinking, Photolithography technique, Photosensitive polymers, Spin coating, Thermally stable