BROWSE
Detail
Journal Article
Fabrication of P-Type ZnO Thin Films Using Rf-Magnetron Sputter Deposition
Cited 15 time in 
Share 
Share
- Authors
- Jun Kwan Kim, Jung Wook Lim, Hyun Tak Kim, Sang Hoon Kim, Sun Jin Yun
- Issue Date
- 2009-04
- Citation
- Electrochemical and Solid-State Letters, v.12, no.4, pp.H109-H112
- ISSN
- 1099-0062
- Publisher
- Electrochemical Society (ECS)
- Language
- English
- Type
- Journal Article
- Abstract
- p-Type ZnO thin films were prepared on phosphorus (P)-doped poly-Si by sputter deposition under various ambient ratios of Ar and O2 and subsequent annealing process at temperatures ranging from 400 to 600°C. The effects of the ambient sputtering gas and annealing temperature on the electrical and material characteristics of ZnO films were investigated. The formation of p-ZnO film on P-doped poly-Si was confirmed through comparisons involving the conduction type of the ZnO film deposited on insulating SiO 2. The film deposited in Ar ambient and annealed at 500°C showed a maximum hole concentration of 5.92 × 1019cm-3. © 2009 The Electrochemical Society.
- KSP Keywords
- Annealing temperature, Doped poly-Si, Material characteristics, P-doped, Polycrystalline silicon(poly-Si), RF-magnetron sputter deposition, SiO 2, ZnO films, ZnO thin films, annealing process, hole concentration