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Journal Article Nanogap Array Fabrication Using Doubly Clamped Freestanding Silicon Nanowires and Angle Evaporations
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Authors
Han Young Yu, Chil Seong Ah, In Bok Baek, An Soon Kim, Jong Heon Yang, Chang Guen Ahn, Chan Woo Park, Byung Hoon Kim
Issue Date
2009-08
Citation
ETRI Journal, v.31, no.4, pp.351-356
ISSN
1225-6463
Publisher
한국전자통신연구원 (ETRI)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.4218/etrij.09.0109.0006
Abstract
We present a simple semiconductor process to fabricate nanogap arrays for application in molecular electronics and nano-bio electronics using a combination of freestanding silicon nanowires and angle evaporation. The gap distance is modulated using the height of the silicon dioxide, the width of the Si nanowires, and the evaporation angle. In addition, we fabricate and apply the nanogap arrays in single-electron transistors using DNAlinked Au nanoparticles for the detection of DNA hybridization.
KSP Keywords
Au nanoparticles(Au-NPs), DNA hybridization, Detection of DNA, Gap distance, Molecular electronics, Nanogap arrays, Semiconductor process, Si nanowires, Silicon dioxide, Silicon nanowires(SiNWs), angle evaporation