ETRI-Knowledge Sharing Plaform

ENGLISH

성과물

논문 검색
구분 SCI
연도 ~ 키워드

상세정보

학술지 Nanogap Array Fabrication Using Doubly Clamped Freestanding Silicon Nanowires and Angle Evaporations
Cited 9 time in scopus Download 17 time Share share facebook twitter linkedin kakaostory
저자
유한영, 아칠성, 백인복, 김안순, 양종헌, 안창근, 박찬우, 김병훈
발행일
200908
출처
ETRI Journal, v.31 no.4, pp.351-356
ISSN
1225-6463
출판사
한국전자통신연구원 (ETRI)
DOI
https://dx.doi.org/10.4218/etrij.09.0109.0006
초록
We present a simple semiconductor process to fabricate nanogap arrays for application in molecular electronics and nano-bio electronics using a combination of freestanding silicon nanowires and angle evaporation. The gap distance is modulated using the height of the silicon dioxide, the width of the Si nanowires, and the evaporation angle. In addition, we fabricate and apply the nanogap arrays in single-electron transistors using DNAlinked Au nanoparticles for the detection of DNA hybridization.
KSP 제안 키워드
Au nanoparticles(Au-NPs), DNA hybridization, Detection of DNA, Gap distance, Molecular electronics, Nanogap arrays, Semiconductor process, Si nanowires, Silicon dioxide, Silicon nanowires(SiNWs), angle evaporation