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Conference Paper Center Wavelength Uniformity of Shallow-Etched Silicon Photonic Wire AWG
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Authors
Duk Jun Kim, Jung Hyung Pyo, Gyung Ock Kim
Issue Date
2009-09
Citation
International Conference on Group IV Photonics (GFP) 2009, pp.128-130
Publisher
IEEE
Language
English
Type
Conference Paper
DOI
https://dx.doi.org/10.1109/GROUP4.2009.5338313
Project Code
09MB1100, Silicon-based high-speed optical interconnection IC, Kim Gyungock
Abstract
We have fabricated a WDM device consisting of two or three shallow-etched AWGs on 5-inch SOI wafer. The center wavelength difference between the closely located AWGs was smaller than 1 nm. Meanwhile, the center wavelength deviation over the whole wafer was larger than 5 nm. ©2009 IEEE.
KSP Keywords
5 nm, Center wavelength, Etched silicon, Photonic wire, Silicon photonics, Soi wafer, wavelength deviation