상세정보
학술지
Low-Temperature Synthesis of Thin Graphite Sheets Using Plasma-Assisted Thermal Chemical Vapor Deposition System
- 저자
- Byeong-Joo Lee, Taeg-Woo Lee, Serin Park, 유한영, Jeong-O Lee, Sung-Hwan Lim, 정구환
- 발행일
- 201104
- 출처
- Materials Letters, v.65 no.7, pp.1127-1130
- ISSN
- 0167-577X
- 출판사
- Elsevier
- 협약과제
- 11MC1500, 차세대 IT기반 기술사업화 기반조성, 장원익
- 초록
- We report the low-temperature synthesis of thin graphite sheets using a hybrid chemical vapor deposition (HCVD) system that combines plasma and thermal CVD (TCVD). Electron beam deposited Ni films were used as catalytic substrates, and methane was used as a carbon feedstock. The quartz tube was into two regions: core plasma region for efficient dissociation of methane and a TCVD region for thermal synthesis, respectively. After the syntheses at different TCVD temperatures from 550 °C to 900 °C, as-grown films were transferred to transparent polymeric substrates to apply as flexible conductive electrodes. Finally, it was found that thin graphite sheets consisting of ~ 15 graphene layers were synthesized at 600 °C using the HCVD system and could be applicable as transparent conductive films. © 2011 Elsevier B.V. All rights reserved.
- KSP 제안 키워드
- As-grown, Chemical Vapor Deposition, Chemical vapour deposition(CVD), Electron Beam, Graphene layers, Low temperature(LT), Low-temperature synthesis, Ni films, Plasma-assisted, Quartz tube, Thin graphite sheets