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Journal Article Low-Temperature Synthesis of Thin Graphite Sheets Using Plasma-Assisted Thermal Chemical Vapor Deposition System
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Authors
Byeong-Joo Lee, Taeg-Woo Lee, Serin Park, Han-Young Yu, Jeong-O Lee, Sung-Hwan Lim, Goo-Hwan Jeong
Issue Date
2011-04
Citation
Materials Letters, v.65, no.7, pp.1127-1130
ISSN
0167-577X
Publisher
Elsevier
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1016/j.matlet.2011.01.045
Project Code
11MC1500, 차세대 IT기반 기술사업화 기반조성, Jang Won Ick
Abstract
We report the low-temperature synthesis of thin graphite sheets using a hybrid chemical vapor deposition (HCVD) system that combines plasma and thermal CVD (TCVD). Electron beam deposited Ni films were used as catalytic substrates, and methane was used as a carbon feedstock. The quartz tube was into two regions: core plasma region for efficient dissociation of methane and a TCVD region for thermal synthesis, respectively. After the syntheses at different TCVD temperatures from 550 °C to 900 °C, as-grown films were transferred to transparent polymeric substrates to apply as flexible conductive electrodes. Finally, it was found that thin graphite sheets consisting of ~ 15 graphene layers were synthesized at 600 °C using the HCVD system and could be applicable as transparent conductive films. © 2011 Elsevier B.V. All rights reserved.
KSP Keywords
As-grown, Chemical Vapor Deposition, Chemical vapour deposition(CVD), Electron Beam, Graphene layer, Low temperature(LT), Low-temperature synthesis, Ni films, Plasma-assisted, Quartz tube, Thin graphite sheets