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Journal Article
Gold Stripe Optical Waveguide Fabricated by a Novel Double-Layered Lift-Off Process
- Authors
- Jin Tae Kim, Sun Tak Park, Seung Koo Park, Min Su Kim, Myung Hyun Lee, Jung Jin Ju
- Issue Date
- 2009-12
- Citation
- ETRI Journal, v.31 no.6, pp.778-783
- ISSN
- 1225-6463
- Publisher
- 한국전자통신연구원 (ETRI)
- Language
- English
- Type
- Journal Article
- Project Code
- 09MB1700, Nano flexible opto-electric PCB module for portable display, Ju Jung Jin
- Abstract
- To fabricate uniform and reliable thin gold stripes that provide low-loss optical waveguides, we developed a novel liftoff process placing an additional SiNx layer under conventional photoresists. By patterning a photoresist and over-etching the SiNx, the photoresist patterns become free-standing structures on a lower-cladding. This leads to uniform metal stripes with good reproducibility and effectively removes parasitic structures on the edge of the metal stripe in the image reversal photolithography process. By applying the newly developed process to polymer based gold stripe waveguide fabrication, we improved the propagation losses about two times compared with that incurred by the conventional imagereversal process. Copyright © 2009 ETRI.
- KSP Keywords
- Double layered, Optical waveguides, Over-etching, Photolithography process, Propagation loss, free-standing structures, lift-off process, low loss, waveguide fabrication