상세정보
학술지
Gold Stripe Optical Waveguide Fabricated by a Novel Double-Layered Lift-Off Process
- 발행일
- 200912
- 출처
- ETRI Journal, v.31 no.6, pp.778-783
- ISSN
- 1225-6463
- 출판사
- 한국전자통신연구원 (ETRI)
- 협약과제
- 09MB1700, 휴대 단말기용 나노 플렉시블 광전배선 모듈, 주정진
- 초록
- To fabricate uniform and reliable thin gold stripes that provide low-loss optical waveguides, we developed a novel liftoff process placing an additional SiNx layer under conventional photoresists. By patterning a photoresist and over-etching the SiNx, the photoresist patterns become free-standing structures on a lower-cladding. This leads to uniform metal stripes with good reproducibility and effectively removes parasitic structures on the edge of the metal stripe in the image reversal photolithography process. By applying the newly developed process to polymer based gold stripe waveguide fabrication, we improved the propagation losses about two times compared with that incurred by the conventional imagereversal process. Copyright © 2009 ETRI.
- KSP 제안 키워드
- Double layered, Optical waveguides, Over-etching, Photolithography process, Propagation loss, free-standing structures, lift-off process, low loss, waveguide fabrication