ETRI-Knowledge Sharing Plaform

KOREAN
논문 검색
Type SCI
Year ~ Keyword

Detail

Journal Article Selective Patterning of ZnO Nanorods on Silicon Substrates Using Nanoimprint Lithography
Cited 37 time in scopus Download 0 time Share share facebook twitter linkedin kakaostory
Authors
Jung Mi Hee, 이효영
Issue Date
201101
Source
Nanoscale Research Letters, v.6 no.1, pp.X1-11
ISSN
1931-7573
Publisher
Springer
DOI
https://dx.doi.org/10.1186/1556-276X-6-159
Project Code
10MB4300, Development of dye-sensitized solar cell replacing transparent conducting glasses, Kang Mangu
Abstract
In this research, nanoimprint lithography (NIL) was used for patterning crystalline zinc oxide (ZnO) nanorods on the silicon substrate. To fabricate nano-patterned ZnO nanorods, patterning of an n-octadecyltrichlorosilane (OTS) self- assembled monolayers (SAMs) on SiO2 substrate was prepared by the polymer mask using NI. The ZnO seed layer was selectively coated only on the hydrophilic SiO2 surface, not on the hydrophobic OTS SAMs surface. The substrate patterned with the ZnO seed layer was treated with the oxygen plasma to oxidize the silicon surface. It was found that the nucleation and initial growth of the crystalline ZnO were proceeded only on the ZnO seed layer, not on the silicon oxide surface. ZnO photoluminescence spectra showed that ZnO nanorods grown from the seed layer treated with plasma showed lower intensity than those untreated with plasma at 378 nm, but higher intensity at 605 nm. It is indicated that the seed layer treated with plasma produced ZnO nanorods that had a more oxygen vacancy than those grown from seed layer untreated with plasma. Since the oxygen vacancies on ZnO nanorods serve as strong binding sites for absorption of various organic and inorganic molecules. Consequently, a nano-patterning of the crystalline ZnO nanorods grown from the seed layer treated with plasma may give the versatile applications for the electronics devices. © 2011 Jung and Lee.
KSP Keywords
5 nm, Binding sites, Nano-patterning, Organic-inorganic, Oxide surface, Oxygen vacancies, Photoluminescence spectra, SAMs surface, Silicon oxide, Silicon substrate, Silicon surfaces