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Journal Article Si micro-ring MUX/DeMUX WDM filters
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Authors
Sahnggi Park, Kap-Joong Kim, In-Gyoo Kim, Gyungock Kim
Issue Date
2011-07
Citation
Optics Express, v.19, no.14, pp.13531-13539
ISSN
1094-4087
Publisher
Optical Society of America(OSA)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1364/OE.19.013531
Abstract
We demonstrate 3rd order micro-ring filters, 100 GHz-spaced 16 channels and 50 GHz-spaced 32 channels. Fabrication-induced resonant wavelength errors, ?? = 0.237 nm, and temperature-dependent wavelength shift, 0.043 nm/°C tolerable to ?봗>10 °C, has been measured on filters based on the fundamental TM mode. The problem of CMOS-compatible photolithography is solved, while maintaining a small radius, R = 9 μm. As some dummy channels are arranged, it is shown that an on-chip optical network for many cores CPU can be constructed by 16 channel ring filters with the currently available technology. © 2011 Optical Society of America.
KSP Keywords
3rd order, CMOS-compatible, Micro-ring, Optical networks, Resonant Wavelength, TM mode, Temperature-dependent, WDM filters, Wavelength shift, on-chip
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