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Multi-Layered Hydrogenated P-Type Microcrystalline Silicon Windows for a-Si:H Thin Film Solar Cells on Opaque Substrates
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- Authors
- Yoo Jeong Lee, Seoung Hyun Lee, Ruud E.I. Schropp, Kyu-Sung Lee, Jung Wook Lim, Sun Jin Yun
- Issue Date
- 2016-04
- Citation
- International Journal of Hydrogen Energy, v.41, no.15, pp.6240-6246
- ISSN
- 0360-3199
- Publisher
- Elsevier
- Language
- English
- Type
- Journal Article
- Abstract
- The effects of multi-layered p-type microcrystalline (μc-) Si:H windows on the performance of substrate-type amorphous Si:H thin film solar cells on opaque substrates were investigated. The results were well explained in terms of H2-plasma-induced damage (HPID) at the p/i-interface and the near-interface region of the light-absorbing layer. The μc-Si:H was deposited using plasma enhanced chemical vapor deposition in a H2-rich atmosphere. A high microcrystalline volume fraction was obtained with a high H2 dilution ratio, which can cause considerable HPID. Cell efficiency was enhanced with a multi-layered p-type μc-Si:H composed of films with low and high crystalline volume fraction, compared to cells with single-layered μc-Si:H. In the multi-layered p-type μc-Si:H, the low crystalline film was placed on an i-Si:H layer to reduce HPID. The present work demonstrated that HPID was reduced at the p/i-interface and the near-interface region of the light-absorbing layer, and that the quality of the p-type μc-Si:H needs to be a significant consideration to achieve high efficiency.
- KSP Keywords
- Absorbing layer, Cell Efficiency, Crystalline films, Crystalline volume fraction, H2 dilution, Interface region, Low crystalline, Microcrystalline silicon, Plasma-enhanced chemical vapor deposition(PECVD), Thin film solar cells, a-Si:H thin film