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학술지 Multi-Layered Hydrogenated P-Type Microcrystalline Silicon Windows for a-Si:H Thin Film Solar Cells on Opaque Substrates
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저자
이유정, 이성현, Ruud E.I. Schropp, 이규성, 임정욱, 윤선진
발행일
201604
출처
International Journal of Hydrogen Energy, v.41 no.15, pp.6240-6246
ISSN
0360-3199
출판사
Elsevier
DOI
https://dx.doi.org/10.1016/j.ijhydene.2016.03.011
협약과제
16MB1300, 차세대 신기능 스마트디바이스 플랫폼을 위한 대면적 이차원소재 및 소자 원천기술 개발, 윤선진
초록
The effects of multi-layered p-type microcrystalline (μc-) Si:H windows on the performance of substrate-type amorphous Si:H thin film solar cells on opaque substrates were investigated. The results were well explained in terms of H2-plasma-induced damage (HPID) at the p/i-interface and the near-interface region of the light-absorbing layer. The μc-Si:H was deposited using plasma enhanced chemical vapor deposition in a H2-rich atmosphere. A high microcrystalline volume fraction was obtained with a high H2 dilution ratio, which can cause considerable HPID. Cell efficiency was enhanced with a multi-layered p-type μc-Si:H composed of films with low and high crystalline volume fraction, compared to cells with single-layered μc-Si:H. In the multi-layered p-type μc-Si:H, the low crystalline film was placed on an i-Si:H layer to reduce HPID. The present work demonstrated that HPID was reduced at the p/i-interface and the near-interface region of the light-absorbing layer, and that the quality of the p-type μc-Si:H needs to be a significant consideration to achieve high efficiency.
키워드
a-Si, H -damage 2, Multi-layered p-Si, Nip-structure, Solar cell
KSP 제안 키워드
Absorbing layer, Cell Efficiency, Crystalline films, Crystalline volume fraction, H2 dilution, Interface region, Low crystalline, Microcrystalline silicon, P-Si, Plasma-enhanced chemical vapor deposition(PECVD), Thin film solar cells