상세정보
학술지
A Single-Chamber System of Initiated Chemical Vapor Deposition and Atomic Layer Deposition for Fabrication of Organic/Inorganic Multilayer Films
- 발행일
- 201706
- 출처
- Advanced Engineering Materials, v.19 no.6, pp.1-9
- ISSN
- 1438-1656
- 출판사
- John Wiley & Sons
- 초록
- A single-chamber system capable of depositing both organic and inorganic layers by initiated chemical vapor deposition (iCVD) and atomic layer deposition (ALD) is demonstrated to facilitate the fabrication of organic/inorganic hybrid thin film encapsulation (TFE). The chamber geometry and the process conditions of iCVD and ALD are similar to each other, which enabled the design of the single-chamber system. Both organic and inorganic films deposited via the single-chamber system produces films with their properties equivalent to those deposited in separate iCVD and ALD reactors. Alternating the deposition mode between iCVD and ALD produces organic/inorganic multilayers with outstanding barrier properties as well as optical transparency mechanical flexibility.
- KSP 제안 키워드
- Atomic Layer Deposition, Deposition mode, Initiated Chemical Vapor Deposition, Inorganic films, Mechanical flexibility, Optical transparency, Organic-inorganic hybrid, Organic/inorganic multilayer, Process conditions, Single-chamber, Thin film encapsulation