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Journal Article Hierarchical Materials Design by Pattern Transfer Printing of SelfAssembled Binary Nanocrystal Superlattices
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Authors
Taejong Paik, Hongseok Yun, Blaise Fleury, Sung-Hoon Hong, Pil Sung Jo, Yaoting Wu, Soong-Ju Oh, Matteo Cargnello, Haoran Yang, Christopher B. Murray, Cherie R. Kagan
Issue Date
2017-02
Citation
Nano Letters, v.17, no.3, pp.1387-1394
ISSN
1530-6984
Publisher
American Chemical Society(ACS)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1021/acs.nanolett.6b04279
Project Code
17JB1300, Wave energy control based ICT ultimate capacity system convergence technology, Sunghoon Hong
Abstract
We demonstrate the fabrication of hierarchical materials by controlling the structure of highly ordered binary nanocrystal superlattices (BNSLs) on multiple length scales. Combinations of magnetic, plasmonic, semiconducting, and insulating colloidal nanocrystal (NC) building blocks are self-assembled into BNSL membranes via the liquid-interfacial assembly technique. Free-standing BNSL membranes are transferred onto topographically structured poly(dimethylsiloxane) molds via the Langmuir-Schaefer technique and then deposited in patterns onto substrates via transfer printing. BNSLs with different structural motifs are successfully patterned into various meso- and microstructures such as lines, circles, and even three-dimensional grids across large-area substrates. A combination of electron microscopy and grazing incidence small-angle X-ray scattering (GISAXS) measurements confirm the ordering of NC building blocks in meso- and micropatterned BNSLs. This technique demonstrates structural diversity in the design of hierarchical materials by assembling BNSLs from NC building blocks of different composition and size by patterning BNSLs into various size and shape superstructures of interest for a broad range of applications.
KSP Keywords
Assembly technique, Binary nanocrystal superlattices, Building block, Colloidal nanocrystal, Different compositions, Electron Microscopy, Free-standing, Interfacial assembly, Langmuir-Schaefer(LS), Multiple length scales, Pattern transfer