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학술대회 Passive and Active Wavelength Trimming of Temperature-Insensitive Silicon MZI
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저자
이종무, 김민수, 안준태, Laetitia Adelmini, Daivid Fowler, Christophe Kopp, Claudio J Oton, Francesco Testa
발행일
201708
출처
International Conference on Group IV Photonics (GFP) 2017, pp.119-120
DOI
https://dx.doi.org/10.1109/GROUP4.2017.8082225
협약과제
17SB1100, 초고속 저전력 광 인터커넥트 구현을 위한 온도무의존 소자 요소 기술, 이종무
초록
Temperature-insensitive silicon MZI with local heaters is fabricated by DUV lithography. Temperature dependence is less than 5pm/°C but the wavelength can be tuned by the local heater at the efficiency of 24mW/FSR. The results are discussed in comparison with permanent wavelength trimming by thermal annealing.
KSP 제안 키워드
DUV lithography, Local heaters, Thermal annealing, temperature dependence, temperature-insensitive