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Conference Paper Passive and Active Wavelength Trimming of Temperature-Insensitive Silicon MZI
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Authors
Jong-Moo Lee, Min-su Kim, Joon Tae Ahn, Laetitia Adelmini, Daivid Fowler, Christophe Kopp, Claudio J Oton, Francesco Testa
Issue Date
2017-08
Citation
International Conference on Group IV Photonics (GFP) 2017, pp.119-120
Language
English
Type
Conference Paper
DOI
https://dx.doi.org/10.1109/GROUP4.2017.8082225
Abstract
Temperature-insensitive silicon MZI with local heaters is fabricated by DUV lithography. Temperature dependence is less than 5pm/°C but the wavelength can be tuned by the local heater at the efficiency of 24mW/FSR. The results are discussed in comparison with permanent wavelength trimming by thermal annealing.
KSP Keywords
DUV lithography, Local heaters, Thermal annealing, temperature dependence, temperature-insensitive