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학술지 Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater
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저자
이종무, 김민수, 안준태, Laetitia Adelmini, Daivid Fowler, Christophe Kopp, Claudio J Oton, Francesco Testa
발행일
201711
출처
IEEE/OSA Journal of Lightwave Technology, v.35 no.22, pp.4903-4909
ISSN
0733-8724
출판사
IEEE, OSA
DOI
https://dx.doi.org/10.1109/JLT.2017.2763244
협약과제
17SB1100, 초고속 저전력 광 인터커넥트 구현을 위한 온도무의존 소자 요소 기술, 이종무
초록
We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to -4 pm/°C at ~1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application.
KSP 제안 키워드
Channel spacing, Coarse wavelength division multiplexing(CWDM), Deep-ultraviolet, Fabrication tolerance, Free spectral range(FSR), Mach-Zehnder(MZ), Mach-Zehnder Interferometer(MZI), Ultraviolet lithography, Wavelength Division Multiplexing(WDM), design parameters, simulation results