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Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater
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- Authors
- Jong-Moo Lee, Min-Su Kim, Joon Tae Ahn, Laetitia Adelmini, Daivid Fowler, Christophe Kopp, Claudio J. Oton, Francesco Testa
- Issue Date
- 2017-11
- Citation
- IEEE/OSA Journal of Lightwave Technology, v.35, no.22, pp.4903-4909
- ISSN
- 0733-8724
- Publisher
- IEEE, OSA
- Language
- English
- Type
- Journal Article
- Abstract
- We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to -4 pm/°C at ~1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application.
- KSP Keywords
- Coarse wavelength division multiplexing(CWDM), Deep-ultraviolet, Fabrication tolerance, Mach-Zehnder(MZ), Mach-Zehnder Interferometer(MZI), Ultraviolet lithography, Wavelength shift, Wavelength-Division multiplexing(WDM), channel spacing, design parameters, free spectral range