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Journal Article Effect of Post-Annealing on Low-Temperature Solution-Processed High-Performance Indium Oxide Thin Film Transistors
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Authors
Yeon-Wha Oh, Hoon Kim, Kyu-Ha Baek, Lee-Mi Do, Ga-Won Lee, Chan-Mo Kang
Issue Date
2018-04
Citation
Science of Advanced Materials, v.10 no.4, pp.518-521
ISSN
1947-2935
Publisher
American Scientific Publishers
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1166/sam.2018.3054
Project Code
15PC2500, Synthesis of Oxide Semiconductor and Insulator Ink Materials and Process Development for Printed Backplane of Flexible Displays Processed Below 150 ºC, Do Lee-Mi
KSP Keywords
High performance, Low temperature(LT), Oxide thin films, Post-annealing, Solution-processed, Thin-Film Transistor(TFT), indium oxide, thin film(TF)