ETRI-Knowledge Sharing Plaform

KOREAN
논문 검색
Type SCI
Year ~ Keyword

Detail

Journal Article Facile Fabrication of Flexible In-Plane Graphene Micro-Supercapacitor via Flash Reduction
Cited 22 time in scopus Download 151 time Share share facebook twitter linkedin kakaostory
Authors
Seok Hun Kang, In Gyoo Kim, Bit-Na Kim, Ji Hwan Sul, Young Sun Kim, In-Kyu You
Issue Date
2018-04
Citation
ETRI Journal, v.40, no.2, pp.275-282
ISSN
1225-6463
Publisher
한국전자통신연구원 (ETRI)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.4218/etrij.2017-0242
Abstract
Flash reduction of graphene oxide is an efficient method for producing high quality reduced graphene oxide under room temperature ambient conditions without the use of hazardous reducing agents (such as hydrazine and hydrogen iodide). The entire process is fast, low-cost, and suitable for large-scale fabrication, which makes it an attractive process for industrial manufacturing. Herein, we present a simple fabrication method for a flexible in-plane graphene micro-supercapacitor using flash light irradiation. All carbon-based, monolithic supercapacitors with in-plane geometry can be fabricated with simple flash irradiation, which occurs in only a few milliseconds. The thinness of the fabricated device makes it highly flexible and thus useful for a variety of applications, including portable and wearable electronics. The rapid flash reduction process creates a porous graphene structure with high surface area and good electrical conductivity, which ultimately results in high specific capacitance (36.90혻mF혻cm?닋2) and good cyclic stability up to 8,000 cycles.
KSP Keywords
All carbon, Cyclic stability, Electrical Conductivity, Facile fabrication, Flash light irradiation, Flash reduction, Graphene structure, High Surface Area, High specific capacitance, Highly flexible, Hydrogen iodide
This work is distributed under the term of Korea Open Government License (KOGL)
(Type 4: : Type 1 + Commercial Use Prohibition+Change Prohibition)
Type 4: