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학술지 Facile Fabrication of Flexible In-Plane Graphene Micro-Supercapacitor via Flash Reduction
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저자
강석훈, 김인규, 김빛나, 설지환, 김영선, 유인규
발행일
201804
출처
ETRI Journal, v.40 no.2, pp.275-282
ISSN
1225-6463
출판사
한국전자통신연구원 (ETRI)
DOI
https://dx.doi.org/10.4218/etrij.2017-0242
초록
Flash reduction of graphene oxide is an efficient method for producing high quality reduced graphene oxide under room temperature ambient conditions without the use of hazardous reducing agents (such as hydrazine and hydrogen iodide). The entire process is fast, low-cost, and suitable for large-scale fabrication, which makes it an attractive process for industrial manufacturing. Herein, we present a simple fabrication method for a flexible in-plane graphene micro-supercapacitor using flash light irradiation. All carbon-based, monolithic supercapacitors with in-plane geometry can be fabricated with simple flash irradiation, which occurs in only a few milliseconds. The thinness of the fabricated device makes it highly flexible and thus useful for a variety of applications, including portable and wearable electronics. The rapid flash reduction process creates a porous graphene structure with high surface area and good electrical conductivity, which ultimately results in high specific capacitance (36.90혻mF혻cm?닋2) and good cyclic stability up to 8,000 cycles.
KSP 제안 키워드
All carbon, Cyclic stability, Electrical conductivity(EC), Facile fabrication, Flash light irradiation, Flash reduction, Graphene oxide(GOS), Graphene structure, High Specific Capacitance, Highly flexible, Hydrogen iodide
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