ETRI-Knowledge Sharing Plaform

KOREAN
논문 검색
Type SCI
Year ~ Keyword

Detail

Journal Article 극한 환경용 반도체 기술 동향
Cited - time in scopus Download 105 time Share share facebook twitter linkedin kakaostory
Authors
장우진, 문재경, 이형석, 임종원, 백용순
Issue Date
2018-12
Citation
전자통신동향분석, v.33, no.6, pp.12-23
ISSN
1225-6455
Publisher
한국전자통신연구원 (ETRI)
Language
Korean
Type
Journal Article
DOI
https://dx.doi.org/10.22648/ETRI.2018.J.330602
Abstract
In this paper, we review the technical trends of diamond and gallium oxide (Ga2O3) semiconductor technologies among ultra-wide bandgap semiconductor technologies for harsh environments. Diamond exhibits some of the most extreme physical properties such as a wide bandgap, high breakdown field, high electron mobility, and high thermal conductivity, yet its practical use in harsh environments has been limited owing to its scarcity, expense, and small-sized substrate. In addition, the difficulty of n-type doping through ion implantation into diamond is an obstacle to the normally-off operation of transistors. Ga2O3 also has material properties such as a wide bandgap, high breakdown field, and high working temperature superior to that of silicon, gallium arsenide, gallium nitride, silicon carbide, and so on. In addition, Ga2O3 bulk crystal growth has developed dramatically. Although the bulk growth is still relatively immature, a 2-inch substrate can already be purchased, whereas 4- and 6-inch substrates are currently under development. Owing to the rapid development of Ga2O3 bulk and epitaxy growth, device results have quickly followed. We look briefly into diamond and Ga2O3 semiconductor devices and epitaxy results that can be applied to harsh environments. are currently under development. Owing to the rapid development of Ga2O3 bulk and epitaxy growth, device results have quickly followed. We look briefly into diamond and Ga2O3 semiconductor devices and epitaxy results that can be applied to harsh environments.
KSP Keywords
Bulk crystal growth, Bulk growth, Epitaxy growth, Gallium Arsenide(GaAs), Gallium Nitride(GaN), Gallium Oxide, High breakdown field, High electron mobility, Ion implantation, Normally-Off, Physical Properties
This work is distributed under the term of Korea Open Government License (KOGL)
(Type 4: : Type 1 + Commercial Use Prohibition+Change Prohibition)
Type 4: