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Tunable Electron and Hole Injection Enabled by Atomically Thin Tunneling Layer for Improved Contact Resistance and Dual Channel Transport in MoS2/WSe2 van der Waals Heterostructure
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- Authors
- Muhammad Atif Khan, Servin Rathi, Changhee Lee, Dongsuk Lim, Yunseob Kim, Sun Jin Yun, Doo-Hyeb Youn, Gil-Ho Kim
- Issue Date
- 2018-07
- Citation
- ACS Applied Materials & Interfaces, v.10, no.28, pp.23961-23967
- ISSN
- 1944-8244
- Publisher
- American Chemical Society(ACS)
- Language
- English
- Type
- Journal Article
- Abstract
- Two-dimensional (2D) material-based heterostructures provide a unique platform where interactions between stacked 2D layers can enhance the electrical and opto-electrical properties as well as give rise to interesting new phenomena. Here, the operation of a van der Waals heterostructure device comprising of vertically stacked bilayer MoS2 and few layered WSe2 has been demonstrated in which an atomically thin MoS2 layer has been employed as a tunneling layer to the underlying WSe2 layer. In this way, simultaneous contacts to both MoS2 and WSe2 2D layers have been established by forming a direct metal-semiconductor to MoS2 and a tunneling-based metal-insulator-semiconductor contacts to WSe2, respectively. The use of MoS2 as a dielectric tunneling layer results in an improved contact resistance (80 k?? μm) for WSe2 contact, which is attributed to reduction in the effective Schottky barrier height and is also confirmed from the temperature-dependent measurement. Furthermore, this unique contact engineering and type-II band alignment between MoS2 and WSe2 enables a selective and independent carrier transport across the respective layers. This contact engineered dual channel heterostructure exhibits an excellent gate control and both channel current and carrier types can be modulated by the vertical electric field of the gate electrode, which is also reflected in the on/off ratio of 104 for both electron (MoS2) and hole (WSe2) channels. Moreover, the charge transfer at the heterointerface is studied quantitatively from the shift in the threshold voltage of the pristine MoS2 and the heterostructure device, which agrees with the carrier recombination-induced optical quenching as observed in the Raman spectra of the pristine and heterostructure layers. This observation of dual channel ambipolar transport enabled by the hybrid tunneling contacts and strong interlayer coupling can be utilized for high-performance opto-electrical devices and applications.
- KSP Keywords
- 2D layers, Carrier Recombination, Channel current, Charge transfer, Contact engineering, Contact resistance(73.40.Cg), Electrical devices, Gate control, High performance, Metal-insulator-semiconductor(MIS), Optical quenching