An electronic textile (e-textile) was fabricated for use in NO2 gas sensor, using graphene oxide (GO) and commercial silk fabric (CSF) (GO-CSF). After thermal reduction at 400, 500, 600 ?꼦, the gas sensing property of the e-textiles (rGO-CSF) was measured for NO2. The morphology, structure, microstructure, and chemical components of the GO-CSF and rGO-CSF were analyzed by scanning electron microscope, x-ray diffraction, Raman spectroscopy, transmission electron microscope, and x-ray photoelectron spectroscope. Gas sensing properties were investigated by exposing rGO-CSF samples to 1, 5, and 10 ppm of NO2 gas at room temperature. The best sensing performance was shown by the rGO-CSF reduced at 400 ?꼦, which was attributed to the large surface area and optimum pore size. Also, performance was stable under bending.
KSP Keywords
Gas sensing properties, Graphene oxide, Large surface area, Pore size, Raman Spectroscopy, Room temperature, Sensing Performance, Silk fabric, Transmission Electron Microscopy(TEM), X-ray Diffraction, X-ray photoelectron spectroscope
Copyright Policy
ETRI KSP Copyright Policy
The materials provided on this website are subject to copyrights owned by ETRI and protected by the Copyright Act. Any reproduction, modification, or distribution, in whole or in part, requires the prior explicit approval of ETRI. However, under Article 24.2 of the Copyright Act, the materials may be freely used provided the user complies with the following terms:
The materials to be used must have attached a Korea Open Government License (KOGL) Type 4 symbol, which is similar to CC-BY-NC-ND (Creative Commons Attribution Non-Commercial No Derivatives License). Users are free to use the materials only for non-commercial purposes, provided that original works are properly cited and that no alterations, modifications, or changes to such works is made. This website may contain materials for which ETRI does not hold full copyright or for which ETRI shares copyright in conjunction with other third parties. Without explicit permission, any use of such materials without KOGL indication is strictly prohibited and will constitute an infringement of the copyright of ETRI or of the relevant copyright holders.
J. Kim et. al, "Trends in Lightweight Kernel for Many core Based High-Performance Computing", Electronics and Telecommunications Trends. Vol. 32, No. 4, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
J. Sim et.al, “the Fourth Industrial Revolution and ICT – IDX Strategy for leading the Fourth Industrial Revolution”, ETRI Insight, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
If you have any questions or concerns about these terms of use, or if you would like to request permission to use any material on this website, please feel free to contact us
KOGL Type 4:(Source Indication + Commercial Use Prohibition+Change Prohibition)
Contact ETRI, Research Information Service Section
Privacy Policy
ETRI KSP Privacy Policy
ETRI does not collect personal information from external users who access our Knowledge Sharing Platform (KSP). Unathorized automated collection of researcher information from our platform without ETRI's consent is strictly prohibited.
[Researcher Information Disclosure] ETRI publicly shares specific researcher information related to research outcomes, including the researcher's name, department, work email, and work phone number.
※ ETRI does not share employee photographs with external users without the explicit consent of the researcher. If a researcher provides consent, their photograph may be displayed on the KSP.