ETRI-Knowledge Sharing Plaform

ENGLISH

성과물

논문 검색
구분 SCI
연도 ~ 키워드

상세정보

학술지 Direct Patterned Zinc-Tin-Oxide for Solution-Processed Thin-Film Transistors and Complementary Inverter through Electrohydrodynamic Jet Printing
Cited 7 time in scopus Download 123 time Share share facebook twitter linkedin kakaostory
저자
Heqing Ye, 권혁진, Xiaowu Tang, 이동윤, 남수지, 김세현
발행일
202007
출처
Nanomaterials, v.10 no.7, pp.1-13
ISSN
2079-4991
출판사
MDPI
DOI
https://dx.doi.org/10.3390/nano10071304
협약과제
20PB1800, 플렉시블 OLED 디스플레이용 산화물 TFT를 위한 고특성 습식 절연소재 및 공정기술 개발, 남수지
초록
The solution-processed deposition of metal-oxide semiconducting materials enables the fabrication of large-area and low-cost electronic devices by using printing technologies. Additionally, the simple patterning process of these types of materials become an important issue, as it can simplify the cost and process of fabricating electronics such as thin-film transistors (TFTs). In this study, using the electrohydrodynamic (EHD) jet printing technique, we fabricated directly patterned zinc-tin-oxide (ZTO) semiconductors as the active layers of TFTs. The straight lines of ZTO semiconductors were successfully drawn using a highly soluble and homogeneous solution that comprises zinc acrylate and tin-chloride precursors. Besides, we found the optimum condition for the fabrication of ZTO oxide layers by analyzing the thermal effect in processing. Using the optimized condition, the resulting devices exhibited satisfactory TFT characteristics with conventional electrodes and conducting materials. Furthermore, these metal-oxide TFTs were successfully applied to complementary inverter with conventional p-type organic semiconductor-based TFT, showing high quality of voltage transfer characteristics. Thus, these printed ZTO TFT results demonstrated that solution processable metal-oxide transistors are promising for the realization of a more sustainable and printable next-generation industrial technology.
KSP 제안 키워드
Active Layer, Complementary inverters, Electrohydrodynamic jet printing, Homogeneous solution, Industrial technology, Low-cost, Metal-oxide(MOX), Next-generation, Optimized condition, Optimum condition, Oxide TFTs
본 저작물은 크리에이티브 커먼즈 저작자 표시 (CC BY) 조건에 따라 이용할 수 있습니다.
저작자 표시 (CC BY)