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학술지 Work Function Tuning of Zinc-Tin Oxide Thin Films Using High-Density O2 Plasma Treatment
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저자
주영희, 위재형, 이우정, 정용덕, 조대형, 강새원, 엄두승, 김창일
발행일
202011
출처
Coatings, v.10 no.11, pp.1-9
ISSN
2079-6412
출판사
MDPI
DOI
https://dx.doi.org/10.3390/coatings10111026
초록
Work function tuning has a significant influence on the performance of semiconductor devices, owing to the formation of potential barriers at the interface between metal-semiconductor junctions. In this work, we introduce a technique for tuning the work function of ZnSnO thin films using high-density O2 plasma treatment. The work function and chemical composition of the ZnSnO thin film surfaces were investigated with regards to plasma treatment time through UPS/XPS systems. The optical band gap was estimated using Tauc's relationship from transmittance data. The work function of Zn0.6 Sn0.4 O thin film increased from 4.16 eV to 4.64 eV, and the optical band gap increased from 3.17 to 3.23 eV. The surface of Zn0.6 Sn0.4 O thin films showed a smooth morphology with an average of 0.65 nm after O2 plasma treatment. The O2 plasma treatment technique exhibits significant potential for application in high-performance displays in optical devices, such as thin-film transistors (TFTs), light-emitting diodes (LEDs), and solar cells.
키워드
O plasma 2, Surface treatment, Transparent conductive oxide, UPS, Work function, XPS, Zinc tin oxide
KSP 제안 키워드
65 nm, High performance, High-density, Light-emitting diodes (leds), Optical band gap, Optical devices, Plasma treatment technique, Potential barrier, Smooth morphology, Solar Cells, Surface treatments