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Journal Article Three-dimensional Wavelength-division Multiplexing Interconnects based on a Low-loss SixNy Arrayed Waveguide Grating
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Authors
Jaegyu Park, Jiho Joo, Myung-Joon Kwack, Gyungock Kim, Sang-Pil Han, Sungil Kim
Issue Date
2021-10
Citation
Optics Express, v.29, no.22, pp.35261-35270
ISSN
1094-4087
Publisher
Optical Society of America (OSA)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.1364/OE.440260
Abstract
We fabricate three-dimensional wavelength-division multiplexing (3D-WDM) interconnects comprising three SixNy layers using a CMOS-compatible process. In these interconnects, the optical signals are coupled directly to a SixNy grating coupler in the middle SixNy layer and demultiplexed by a 1 × 4 SixNy array waveguide grating (AWG). The demultiplexed optical signals are interconnected from the middle SixNy layer to the bottom and top SixNy layers by four SiOxNy interlayer couplers. A low insertion loss and low crosstalk are achieved in the AWG. The coupling losses of the SiOxNy interlayer couplers and SixNy grating coupler are ~1.52 dB and ~4.2 dB, respectively.
KSP Keywords
Array waveguide grating, CMOS-compatible, Coupling loss, D-WDM, Low crosstalk, Low loss, Three dimensional(3D), Wavelength-Division multiplexing(WDM), arrayed waveguide grating(AWG), grating coupler, low insertion loss
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