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Conference Paper Importance of contact resistance on the device mobility of ultra-thin indium oxide formed by atomic layer deposition

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Authors: Ju-Hun Lee, Seung-Youl Kang, Chihun Sung, Jong-Heon Yang, Chi-Sun Hwang, Jaehyun Moon

Issue Date: 2023-05

Citation: Compound Semiconductor Week (CSW) 2023, pp.611-612

Language: English

Type: Conference Paper

KSP Keywords: Atomic Layer Deposition, Contact resistance(73.40.Cg), Ultra-thin, indium oxide

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