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Journal Article
Light field microscope target with low power, low pressure reactive ion etching process
- Authors
- Chihoon Kim, Sang Yun Kim, Munseob Lee
- Issue Date
- 2023-06
- Citation
- Current Applied Physics, v.50, pp.127-132
- ISSN
- 1567-1739
- Publisher
- Elsevier BV
- Language
- English
- Type
- Journal Article
- Project Code
- 23HK1200, Developement for technology of examination and image acquisition by using plenoptic microscopy, Lee Mun Seob
- KSP Keywords
- Field microscope, Low-Power, Reactive ion etching(RIE), light field, low pressure, reactive ion etching process
This work is distributed under the term of Creative Commons License (CCL)
(CC BY)
(CC BY)
