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Detail
Journal Article
Light field microscope target with low power, low pressure reactive ion etching process
- Authors
- Chihoon Kim, Sang Yun Kim, Munseob Lee
- Issue Date
- 2023-06
- Citation
- Current Applied Physics, v.50, pp.127-132
- ISSN
- 1567-1739
- Publisher
- Elsevier BV
- Language
- English
- Type
- Journal Article
- KSP Keywords
- Field microscope, Light Field, Low pressure, low power, reactive ion etching process
This work is distributed under the term of Creative Commons License (CCL)
(CC BY)
(CC BY)
