BROWSE
Detail
Journal Article
Fabrication of a photo-crosslinkable fluoropolymer-passivated flexible neural probe and acute recording and stimulation performances in vivo
- Authors
- Yong Hee Kim, Ho Koo, Min Sun Kim, Sang-Don Jung
- Issue Date
- 2023-11
- Citation
- Materials Science and Engineering C, v.154, pp.1-12
- ISSN
- 0928-4931
- Publisher
- Elsevier BV
- Language
- English
- Type
- Journal Article
- Abstract
- Herein, we fabricated fluorine-containing, polymer-based, flexible neural probes with fluorinated ethylene propylene (FEP) films as the substrates and photo-crosslinkable fluoropolymers as the passivation material. For fabrication, metal-free Au layer formation on the FEP film, the simultaneous photo-adhesion and photo-patterning technique, and the pulsed-laser scanning probe shaping technique were combined, followed by Au electrode surface modification. The resultant probes achieved a charge injection limit equal to 5.18 mC cm−2 by implementing iridium oxide-modified nanoporous Au (IrOx/NPG) structures. We performed simultaneous in vivo micro-stimulations of the Schaffer collateral fibres and recorded the evoked field excitatory postsynaptic potentials (fEPSPs) in the stratum radiatum layer of the hippocampal Cornu Ammonis 1 region using a single probe. Inducing the fEPSP at very low charge per pulse settings (3.2–3.6 nC/pulse) indicates the efficient charge injection capability of the IrOx/NPG electrode, thereby enabling safe, prolonged, and thrifty micro-stimulations. Furthermore, the single probe-induced and recorded long-term potentiation persisted for periods longer than 60 min following theta-burst stimulation. The materials used in this study are all biocompatible and chemically robust. The fabricated neural probes can be applied in chronic clinical trials in vivo.
- KSP Keywords
- Au electrode, Au layer, Clinical trials, Electrode surface modification, Field excitatory postsynaptic potentials, Fluorinated ethylene propylene, Fluorine-containing, Layer formation, Metal-free, Nanoporous Au, Patterning technique
This work is distributed under the term of Creative Commons License (CCL)
(CC BY NC ND)
(CC BY NC ND)
