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Wide process temperature of atomic layer deposition for In2 O3 thin-film transistors using novel indium precursor (N,N′-di-tert butylacetimidamido)dimethyllindium
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- Authors
- Ju-Hun Lee, Seung-Youl Kang, Changbong Yeon, Jong-Heon Yang, Jaesun Jung, Kok Chew Tan, Kitae Kim, Yeonjin Yi, Soohyung Park, Chi-Sun Hwang, Jaehyun Moon
- Issue Date
- 2024-09
- Citation
- Nanotechnology, v.35, no.37, pp.1-9
- ISSN
- 0957-4484
- Publisher
- Institute of Physics Publishing
- Language
- English
- Type
- Journal Article
- Abstract
- This study introduces a novel heteroleptic indium complex, which incorporates an amidinate ligand, serving as a high-temperature atomic layer deposition (ALD) precursor. The most stable structure was determined using density functional theory and synthesized, demonstrating thermal stability up to 375 °C. We fabricated indium oxide thin-film transistors (In2O3 TFTs) prepared with DBADMI precursor using ALD in wide range of window processing temperature of 200 °C, 300 °C, and 350 °C with an ozone (O3) as the source. The growth per cycle of ALD ranged from 0.06 to 0.1 nm cycle−1 at different deposition temperatures. X-ray diffraction and transmission electron microscopy were employed to analyze the crystalline structure as it relates to the deposition temperature. At a relatively low deposition temperature of 200 °C, an amorphous morphology was observed, while at 300 °C and 350 °C, crystalline structures were evident. Additionally, x-ray photoelectron spectroscopy analysis was conducted to identify the In–O and OH-related products in the film. The OH-related product was found to be as low as 1% with an increase the deposition temperature. Furthermore, we evaluated In2O3 TFTs and observed an increase in field-effect mobility, with minimal change in the threshold voltage (V th), at 200 °C, 300 °C, and 350 °C. Consequently, the DBADMI precursor, given its stability at highdeposition temperatures, is ideal for producing high-quality films and stable crystalline phases, with wide processing temperature range makeing it suitable for various applications.
- KSP Keywords
- Amidinate ligand, Atomic Layer Deposition, Crystalline structure, Electron microscopy(SEM), High Temperature, High-quality films, Indium complex, Low deposition temperature, Process temperature, Processing temperature, Spectroscopy analysis