BROWSE
Detail
Journal Article
Quantum electrodynamical formulation of photochemical acid generation and its implications on optical lithography
- Authors
- Seungjin Lee
- Issue Date
- 2024-10
- Citation
- ETRI Journal, v.46, no.5, pp.774-782
- ISSN
- 1225-6463
- Publisher
- 한국전자통신연구원
- Language
- Korean
- Type
- Journal Article
- Abstract
- The photochemical acid generation is refined from the first principles of quantum electrodynamics. First, we briefly review the formulation of the quantum theory of light based on the quantum electrodynamics framework to establish the probability of acid generation at a given spacetime point. The quantum mechanical acid generation is then combined with the deprotection mechanism to obtain a probabilistic description of the deprotection density directly related to feature formation in a photoresist. A statistical analysis of the random deprotection density is presented to reveal the leading characteristics of stochastic feature formation.
- KSP Keywords
- Optical lithography, Quantum Mechanical, Quantum Theory, Quantum electrodynamics, Statistical Analysis, first-principles
This work is distributed under the term of Korea Open Government License (KOGL)
(Type 4: : Type 1 + Commercial Use Prohibition+Change Prohibition)
(Type 4: : Type 1 + Commercial Use Prohibition+Change Prohibition)
