Journal Article
Design, fabrication, and optical imaging performance comparison of precision microlens arrays for application in plenoptic microscopy systems
This study focuses on analyzing the characteristics of a microlens array produced by 3D diffusion lithography and the characteristics of the optical system based on the arrangement of the lenses. The microlens array, with an 85 μm pitch, 2.1 mm focal length, and 1 μm sag, was designed to match the numerical aperture of a 10×, 0.25 NA objective lens. Photoresist, aluminum, and photoresist layers were deposited onto a silicon substrate. After patterning with a photomask, the aluminum layer was etched to form a metal mask for subsequent diffusion lithography. The use of a metal mask improved the uniformity of the mold of the microlens array. A microlens array was replicated using polydimethylsiloxane, and the characteristics of this lens were very close to the design values, with an average pitch of 86.02 μm, sag of 1.078 μm, and substrate thickness of 1.067 mm. In addition, the Strehl ratio had a median value of 0.975, indicating excellent performance. The microlens array was integrated into two configurations: plenoptic camera module 1, in which the microlens array was directly attached to the sensor, and plenoptic camera module 2, in which it was mounted separately. A comparative analysis of the spatial resolution and depth of field of both modules revealed that both configurations achieved the same spatial resolution of 7.8 μm. However, plenoptic camera module 2 provided a wider depth of field than plenoptic camera module 1, allowing for clear imaging over a broader depth range.
KSP Keywords
3D diffusion, Comparative analysis, Depth of Field, Depth range, Design values, Focal length, Imaging performance, Microlens array, Numerical aperture, Objective lens, Optical System
This work is distributed under the term of Creative Commons License (CCL)
(CC BY NC ND)
Copyright Policy
ETRI KSP Copyright Policy
The materials provided on this website are subject to copyrights owned by ETRI and protected by the Copyright Act. Any reproduction, modification, or distribution, in whole or in part, requires the prior explicit approval of ETRI. However, under Article 24.2 of the Copyright Act, the materials may be freely used provided the user complies with the following terms:
The materials to be used must have attached a Korea Open Government License (KOGL) Type 4 symbol, which is similar to CC-BY-NC-ND (Creative Commons Attribution Non-Commercial No Derivatives License). Users are free to use the materials only for non-commercial purposes, provided that original works are properly cited and that no alterations, modifications, or changes to such works is made. This website may contain materials for which ETRI does not hold full copyright or for which ETRI shares copyright in conjunction with other third parties. Without explicit permission, any use of such materials without KOGL indication is strictly prohibited and will constitute an infringement of the copyright of ETRI or of the relevant copyright holders.
J. Kim et. al, "Trends in Lightweight Kernel for Many core Based High-Performance Computing", Electronics and Telecommunications Trends. Vol. 32, No. 4, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
J. Sim et.al, “the Fourth Industrial Revolution and ICT – IDX Strategy for leading the Fourth Industrial Revolution”, ETRI Insight, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
If you have any questions or concerns about these terms of use, or if you would like to request permission to use any material on this website, please feel free to contact us
KOGL Type 4:(Source Indication + Commercial Use Prohibition+Change Prohibition)
Contact ETRI, Research Information Service Section
Privacy Policy
ETRI KSP Privacy Policy
ETRI does not collect personal information from external users who access our Knowledge Sharing Platform (KSP). Unathorized automated collection of researcher information from our platform without ETRI's consent is strictly prohibited.
[Researcher Information Disclosure] ETRI publicly shares specific researcher information related to research outcomes, including the researcher's name, department, work email, and work phone number.
※ ETRI does not share employee photographs with external users without the explicit consent of the researcher. If a researcher provides consent, their photograph may be displayed on the KSP.