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Journal Article
Mitigating hydrogen-related instabilities in oxide thin-film transistor via nitrogen-engineered passivation layer for thermal stability
- Authors
- I.Sak Lee, Jae Won Na, Kyungmoon Kwak, Jong Bin An, Hyun Jae Kim
- Issue Date
- 2025-09
- Citation
- Applied Surface Science Advances, v.29, pp.1-11
- ISSN
- 2666-5239
- Publisher
- Elsevier
- Language
- English
- Type
- Journal Article
- KSP Keywords
- Thin-Film Transistor(TFT), oxide thin-film transistors, passivation layer, thermal stability, thin film(TF)
This work is distributed under the term of Creative Commons License (CCL)
(CC BY NC)
(CC BY NC)
