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Conference Paper Direct Nanoimprint Lithography for High-Refractive-Index, High-Aspect-Ratio Meta-Pattern Fabrication

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Authors: Sung-Hoon Hong, Ji-Young Oh

Issue Date: 2025-11

Citation: International Conference on Advanced Electromaterials (ICAE) 2025, pp.1-1

Language: English

Type: Conference Paper

KSP Keywords: Direct nanoimprint, High Aspect Ratio, Nanoimprint lithography(NIL), refractive index

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